Process for producing electrically impervious anodized films on valve metals and product thereof
US5211832A · kind A · utility
12Cited by
10References
30Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 22, 1992 |
| Grant date | May 18, 1993 |
| Priority date | — |
| Expiry date | Apr 22, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E60/13
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method is disclosed for producing an anodized film on titanium, its alloys and other metals such that the film deposited will have a specific leak rate of less than one nanoamp per square centimeter at room temperature with an impressed electric field of at least five volts, where the anodization is performed in a solution consisting of liquid ortho-phosphoric acid of reduced water content in an aprotic solvent, and articles of manufacture therefrom.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.