Method of forming a permselective layer
US5212050A · kind A · utility
239Cited by
18References
48Claims
0Family size
Inventors
Key dates
| Filing date | Aug 15, 1990 |
| Grant date | May 18, 1993 |
| Priority date | — |
| Expiry date | Aug 15, 2010 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2035/1076
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of forming a permselective layer on preselected areas of a substantially planar sensing device is disclosed. The claimed method includes establishing and confining a liquid film, derived from a silane compound mixed in a suitable solvent, within a predetermined area of the sensing device. The process relates to photolithographic imaging and developing methods coupled to a film-curing step that provides a patterned permselective layer having the desired semipermeable characteristics.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.