Gas injector for hypochlorous acid reactor
US5213771A · kind A · utility
7Cited by
12References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 31, 1988 |
| Grant date | May 25, 1993 |
| Priority date | — |
| Expiry date | Oct 31, 2008 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01J2219/00777
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
An elongated, generally vertically extending cocurrent reactor vessel for the production of hypochlorous acid by the mixing and reaction of a liquid alkali metal hydroxide and a gaseous halogen is provided wherein a nozzle is mounted near the top of the reactor vessel beneath the gas injector to spray the liquid alkali metal hydroxide in droplets so that the halogen gas can be absorbed into the surface of the droplets simultaneously with water evaporation in the vessel. The vessel has a spraying and reaction zone immediately beneath the atomizer and a drying zone beneath the spraying and reaction zone.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.