Charged particle beam deflector
US5214289A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Nov 26, 1991 |
| Grant date | May 25, 1993 |
| Priority date | — |
| Expiry date | Nov 26, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/0437
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A charged particle beam deflector has a simple structure for providing a uniform potential distribution over each blanking aperture. The deflector is easy to operate, and stabilizes the shape of a charged particle beam component passing through each blanking aperture even with a low deflection voltage. A pair of deflecting electrodes are arranged on opposing inner walls of each blanking aperture. A voltage applied to the deflecting electrodes is controlled to correctly deflect the charged particle beam component passing through the blanking aperture. A pair of resistance films are arranged on the other opposing inner walls of the blanking aperture, to connect both sides of the deflecting electrodes. The deflector may employ patterned beam generating apertures. A pair of deflecting electrodes are formed on opposing inner walls of each of the apertures. A voltage applied to the deflecting electrodes is controlled to correctly deflect a charged particle beam component passing through the aperture.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.