Chemical milling solution for reduced hydrogen absorption
US5217569A · kind A · utility
7Cited by
1References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 31, 1991 |
| Grant date | Jun 8, 1993 |
| Priority date | — |
| Expiry date | Dec 31, 2011 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23F1/26
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A solution is described for the chemical processing of beta phase-containing titanium alloys. The solution contains HNO.sub.3 and HF, along with a small but effective amount of copper, ruthenium, rhodium, palladium, osmium, iridium, platinum or gold to reduce hydrogen absorption, ammonium formate and citric acid to increase the milling rate, and a surfactant to ensure a satisfactory milled surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.