Decoupled dual-beam control system
US5219347A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 24, 1991 |
| Grant date | Jun 15, 1993 |
| Priority date | — |
| Expiry date | Dec 24, 2011 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61B2034/742
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A decoupled dual-beam control system for a compact micromanipulator unit for a surgical laser system includes a focusing mechanism for focusing a first laser beam of a first wavelength at a predetermined focal point; and a control mechanism for directing a second laser beam of a second wavelength onto the focusing mechanism; the control mechanism includes a device for varying the diameter and wavefront of the second laser beam at the focusing mechanism for enabling the focusing mechanism to focus the second beam in the same focal plane as the first beam. The control mechanism further includes a device for translating the second beam relative to the focusing mechanism for enabling the focusing mechanism to coincidentally position the foci of the surgical and aiming beams in the focal plane.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.