Patent · US Expired

Positive photoresist containing 1,2-naphthoquinone-diazide-5-sulfonyl tris ester of 1,3,5-trihydroxybenzene and aromatic hydroxy compound sensitizer

US5219701A · kind A · utility

3Cited by

6References

1Claims

0Family size

Assignee

Ciba-Geigy · US

Inventors

Reinhard Schulz · Hannover, DE
Horst Munzel · Darmstadt, DE

Key dates

Filing date	Oct 2, 1991
Grant date	Jun 15, 1993
Priority date	—
Expiry date	Oct 2, 2011

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/022
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Structures of high resolution in the near UV range and of high sharpness of edge and steepness of edge can be obtained by means of positive photoresists containing, in an organic solvent, in each case essentially at least PA0 (a) an alkali-soluble resin PA0 (b) a 1,2-naphthoquinone-diazide-5-sulfonyl ester of a trihydroxybenzene isomer PA0 (c) an aromatic hydroxy compound and also, if appropriate, further customary additives, and in which the result of component (b) is to give an absorption coefficient of at least 0.5 .mu.m.sup.-1 for the photobleachable absorption, and component (c) is present in a concentration of 15-30% by weight, relative to the total solids content.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.