Excimer laser with hydrogen chloride and method for producing hydrogen chloride for an excimer laser
US5220574A · kind A · utility
3Cited by
1References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 19, 1991 |
| Grant date | Jun 15, 1993 |
| Priority date | — |
| Expiry date | Nov 19, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/036
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An excimer laser having a chamber (10) in which a gas-discharge is performed with participation of hydrogen-chloride comprises means with which the hydrogen chloride is formed by hydrolysis.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.