Plasma surface treating method
US5221416A · kind A · utility
15Cited by
1References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 31, 1991 |
| Grant date | Jun 22, 1993 |
| Priority date | — |
| Expiry date | May 31, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3342
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In a plasma surface treating method, a sample to be treated is supported on a first electrode within a vacuum vessel and a second electrode is caused to confront the first electrode. Active species of negative ions are then generated by means of a direct current glow discharge produced in an abnormal glow discharge region and are subsequently impinged upon a surface of the sample to induce a chemical reaction with the sample.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.