Method of manufacturing a magnetic disk substrate of titanium
US5221459A · kind A · utility
27Cited by
0References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 24, 1992 |
| Grant date | Jun 22, 1993 |
| Priority date | — |
| Expiry date | Apr 24, 2012 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25D11/26
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method of manufacturing a magnetic disk substrate made of titanium, in which chemical etching is performed on a titanium disk for magnetic disk substrate, thereby removing a surface portion thereof having a thickness of at least 2 nm, and the new surface of the titanium disk, formed by the chemical etching, is anodized, thereby forming anodized film on the titanium disk.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.