Method and apparatus for surface treating an axially symmetric substrate at atmosphere pressure
US5225659A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Apr 10, 1992 |
| Grant date | Jul 6, 1993 |
| Priority date | — |
| Expiry date | Apr 10, 2012 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/47
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A surface treating apparatus which comprises a hollow cylindrical electrode and a counter electrode provided within the hollow cylindrical electrode, and a power supply for applying a potential between the electrode and the counter electrode to cause an atmospheric pressure plasma in the presence of a selected gas to generate within the cylindrical electrode is described. A method is also described, wherein a material to be treated is placed between the electrodes and a potential is applied therebetween to generate the plasma to effect the surface treatment of the material. The method and apparatus are very effective for surface treatment of axially symmetric substrates in the form of bars, tubes or fibers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.