Method for making flexible circuits
US5227008A · kind A · utility
46Cited by
11References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 23, 1992 |
| Grant date | Jul 13, 1993 |
| Priority date | — |
| Expiry date | Jan 23, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24917
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A process for making flexible circuits wherein the etching of a polymeric film is accomplished by dissolving portions thereof with concentrated aqueous base using an aqueous processible crosslinked photoresist as a mask, comprising the steps of laminating the resist on a polymeric film, exposing a pattern into the resist, developing the resist with a dilute aqueous solution until desired image is obtained, etching portions of the polymeric film not covered by the crosslinked resist with a concentrated base at a temperature of from about 50.degree. C. to about 120.degree. C., and then stripping the resist off the polymeric film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.