X-ray mask and its fabricating method-comprising a first and second alignment pattern
US5227268A · kind A · utility
4Cited by
1References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 11, 1991 |
| Grant date | Jul 13, 1993 |
| Priority date | — |
| Expiry date | Oct 11, 2011 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K1/06
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An object of the sub- invention is to offer a X-ray mask capable of providing sufficiently strong alignment signal and to improve alignment accuracy. The X ray mask of the subject invention becomes the circuitry pattern and the alignment pattern on one main surface of the X-ray permeable film. Since the structure is also provided with a X-ray absorbant pattern, and this structure enables the laser beam without attenuation to illuminate the alignment pattern formed on the other surface of the X-ray permeable film, and by further optimizing the height of the alignment marks, a sufficiently strong alignment signal is obtained.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.