Lithography apparatus using scanning tunneling microscopy
US5227626A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 30, 1992 |
| Grant date | Jul 13, 1993 |
| Priority date | — |
| Expiry date | Jan 30, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/868
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A lithography apparatus is provided with an SXM base, which has a plurality of cantilevers movably supporting probes at their free ends, respectively. The SXM base is secured to a mirror base by a support arm via inchworm devices, such that it faces a silicon wafer placed on a wafer stage. The silicon wafer has an alignment pattern formed thereon, while the SXM base has a reference alignment pattern formed thereon which is similar to the alignment pattern. A voltage is applied to the probes at a predetermined point of time under the control of a controller while a gas containing a film-forming material is being supplied onto the wafer, whereby the film-forming material is adsorbed in a desired portion of the surface of the wafer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.