Liquid crystal mask type laser marking system
US5231263A · kind A · utility
13Cited by
2References
34Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 8, 1991 |
| Grant date | Jul 27, 1993 |
| Priority date | — |
| Expiry date | Mar 8, 2011 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70308
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Disclosed is a liquid crystal mask type laser marking system for transferring a pattern information onto an object to be worked. A laser beam emitted from a laser oscillator is applied to a liquid crystal mask having a pattern mask. The laser beam outgoing from the liquid crystal mask is applied to a wavelength converter, which converts the laser beam to one having a wavelength to which the object to be worked is sensitive. The converted laser beam is applied to the object to be worked.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.