Nitrogen-containing materials for wear protection and friction reduction
US5232570A · kind A · utility
32Cited by
9References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 28, 1991 |
| Grant date | Aug 3, 1993 |
| Priority date | — |
| Expiry date | Jun 28, 2011 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B5/72
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A hard protective material and method for forming the medium having the formula C.sub.x N.sub.y. The medium may be formed as a protective film on a magnetic recording disk in a sputtering apparatus such as a magnetron apparatus. The amount of nitrogen in the film may be affected by controlling the collisions of the sputtered material between the target and deposition substrate by controlling the bombardment of the substrate by electrons. The films exhibit properties indicative of a textured morphology on a nanoscale which enhances the retention of lubricant overcoats.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.