Positive type photosensitive resinous composition comprising a resin copolymer having at least a phosphoric acid ester monomer
US5232816A · kind A · utility
2Cited by
8References
1Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 31, 1990 |
| Grant date | Aug 3, 1993 |
| Priority date | — |
| Expiry date | Aug 31, 2010 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A positive type photosensitive resinous composition comprising a binder resin and a quinone diazide compound, the binder resin being a copolymer of PA1 (a) at least one phosphoric acid ester monomer represented by the formula: ##STR1## (b) at least one acid group containing .alpha.,.beta.-ethylenically unsaturated monomer, and PA1 (c) other copolymerizable .alpha.,.beta.-ethylenically unsaturated monomers than (a) and (b), which is specifically useful for the formation of resist coating in the preparation of printed circuit board.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.