Method for annealing phosphors applied to surfaces having melting points below the annealing temperature of the phosphor
US5234484A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 24, 1992 |
| Grant date | Aug 10, 1993 |
| Priority date | — |
| Expiry date | Feb 24, 2012 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/56
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for annealing a deposited material on a substrate structure, where the annealing temperature of the deposited material is greater than the melting temperature of the substrate structure, including the step of inserting the substrate structure into an oven preheated to a temperature above the annealing temperature. The substrate structure is kept in the oven for a time interval wherein the mean temperature of the deposited material is above the annealing temperature and the mean temperature of the substrate structure is below its melting temperature. The substrate structure may be actively cooled while in the oven, thus increasing the time interval the mean temperature of the deposited material can be maintained above the annealing temperature.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.