Fe-Ni alloy sheet for shadow mask, excellent in etching pierceability, preventing sticking during annealing, and inhibiting production of gases
US5234512A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 3, 1991 |
| Grant date | Aug 10, 1993 |
| Priority date | — |
| Expiry date | Sep 3, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2229/0733
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An Fe-Ni alloy sheet for a shadow mask excellent in etching pierceability, preventing sticking during annealing, and inhibiting production of gases, which consists essentially of: ______________________________________ nickel (Ni) from 34 to 38 wt. %, silicon (Si) from 0.01 to 0.09 wt. %, aluminum (Al) from 0.002 to 0.020 wt. %, calcium (Ca) from 0.0002 to 0.0020 wt. %, magnesium (Mg) from 0.0003 to 0.0020 wt. %, where, Ca + 1/2 Mg from 0.0005 to 0.0025 wt. %, ______________________________________ and PA1 the balance being iron and incidental impurities, PA1 where, the contents of carbon (C), nitrogen (N), sulfur (S), oxygen (O) and phosphorus (P) as the incidental impurities being respectively: PA1 up to 0.0050 wt.% for carbon, PA1 up to 0.0020 wt.% for nitrogen, PA1 up to 0.0020 wt.% for sulfur, PA1 up to 0.0040 wt.% for oxygen, and PA1 up to 0.0040 wt.% for phosphorus, PA1 where, 1/10 C+1/10 N+S+1/5 O+1/2P: PA2 up to 0.0045 wt.%, and PA2 Ca+1/2 Mg.gtoreq.S+1/5 O; and PA1 the surface portion of the Fe-Ni alloy sheet having a silicon (Si) segregation rate, as expressed by the following formula, of up to 10%: ##EQU1##
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.