Method of developing presensitized offset printing plates and developing solution used in that method
US5234796A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 9, 1991 |
| Grant date | Aug 10, 1993 |
| Priority date | — |
| Expiry date | Jul 9, 2011 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/322
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A developing solution of an imagewise exposed, presensitized offset printing plate is disclosed. The developing solution has a pH of at least 12.5, and contains a low content of a silicate in an amount of up to 1.0 wt % as SiO.sub.2, a surfactant in an amount of 0.01 to 10 wt %, an aromatic carboxylic acid in an amount of 0.1 to 10 wt %, and an amine compound represented by the following general formula (I) in an amount of 0.1 to 10 wt %: EQU R.sub.1 --N(R.sub.2)--J--OH (I) wherein R.sub.1 and R.sub.2 are each independently a hydrogen atom, a group --C.sub.2 H.sub.4 OH or a group --C.sub.3 H.sub.6 OH; and J is a group --C.sub.2 H.sub.4 -- or --C.sub.3 H.sub.6 --.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.