Method of preparing silica glass
US5236483A · kind A · utility
25Cited by
14References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 30, 1992 |
| Grant date | Aug 17, 1993 |
| Priority date | — |
| Expiry date | Oct 30, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S65/901
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A method for preparing a silica glass article of improved purity is provided. The article is prepared by a sol-gel method and is then heat treated to a selected temperature between about 1500.degree. and 2200.degree. C. and maintained at the selected temperature for a predetermined period of time sufficient to remove silica crystals, inclusions, microcracks and bubbles. The resulting silica glass articles have improved purity and can be used as photomask substrates or as preforms for optical fibers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.