Plasma CVD process for coating a dome-shaped substrate

US5236511A · kind A · utility

Assignee

• Schott Glaswerke · DE

Inventors

• Heinz-Werner Etzkorn · Neu-Anspach, DE
• Harald Krummel · Mainz, DE
• Volker Paquet · Mainz, DE
• Günter Weidmann · Stuttgart, DE

Key dates

• Filing date: Oct 29, 1991
• Grant date: Aug 17, 1993
• Expiry date: Oct 29, 2011

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/45563
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A plasma-CVD process and apparatus for coating strongly arched, dome-like substrates with a dielectric and/or metallic coating system on the inside and/or outside face. The thickness of the gas layer to be reacted above the face to be coated is adjusted such as with the aid of the displacement body, so that the extent of the homogeneous reaction or formation occurring in the gas layer during a plasma phase is harmless for the desired coating quality. Strongly arched substrates coated with a uniform coating of highest optical quality and also mechanical, thermal and chemical stability without complicated substrate movement. Specified axial and azimuthal coating thickness profiles can also be superimposed by suitably shaping the displacement body.