Method and apparatus for cleaning surfaces with plasma
US5236512A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 14, 1991 |
| Grant date | Aug 17, 1993 |
| Priority date | — |
| Expiry date | Aug 14, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/162
- WIPO fieldFurniture, games
- WIPO sectorOther fields
Abstract
A device is provided for cleaning a surface by introducing a highly reactive gas mixture to the surface. The highly reactive gas mixture may include excited species such as ozone and relate excited ions, atoms, and electrons. The excited gas mixture then oxidizes undesirable materials on the surface. The device includes a structure which defines an enclosed space when placed against the surface to be cleaned. A set of one or more electrodes are positioned within the device such that an electrical discharge across the electrodes excites the selected gases species. The electrodes are attached to a power supply capable of generating a high frequency, high voltage discharge. A tube is provided for transporting selected gases, such as air or oxygen, to the enclosed space. Another tube is provide for removing reaction products from the enclosed space. This tube is place in communication with a source of suction for establishing a flow of gases into and out of the enclosed space.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.