Determination of refractive index and thickness of thin layers
US5237392A · kind A · utility
15Cited by
3References
7Claims
0Family size
Assignee
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Key dates
| Filing date | Aug 13, 1992 |
| Grant date | Aug 17, 1993 |
| Priority date | — |
| Expiry date | Aug 13, 2012 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/0616
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The refractive index and thickness of ultrathin layers<1 .mu.m in thickness are determined by recording the layers, which have been applied to a solid support, by surface plasmon microscopy as a function of the angle of incidence of the incident laser beam, the method making it possible to determine layer thicknesses with a vertical resolution.gtoreq.0.1 nm and a simultaneous lateral resolution.gtoreq.5 .mu.m.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.