Material treating apparatus
US5238399A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Feb 5, 1992 |
| Grant date | Aug 24, 1993 |
| Priority date | — |
| Expiry date | Feb 5, 2012 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF27B15/00
- WIPO fieldThermal processes and apparatus
- WIPO sectorMechanical engineering
Abstract
A material treating apparatus having a treating chamber through which material is continuously displaced over an elongated, horizontally disposed bedplate. The bedplate is formed with a large number of small apertures distributed over the plate and permitting a gaseous treating fluid to flow upwardly through the bedplate and the overlying material to effect its treatment. A distribution chamber for the gaseous fluid underlies and extends the length of the bedplate and connects at one longitudinal end with a source of the fluid. This source induces the gaseous fluid to flow into and then longitudinally through the distribution chamber ultimately exiting through the apertures of the bedplate. A flow control plate is positioned in the distribution chamber adjacent the end through which the gaseous fluid enters. The plate extends horizontally across the chamber and is pivotable about a horizontal axis to a selected angular position to cause the gaseous fluid to flow along a desired path through the distribution chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.