Analysis of Rheed data from rotating substrates
US5238525A · kind A · utility
13Cited by
8References
16Claims
0Family size
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Key dates
| Filing date | Jan 27, 1992 |
| Grant date | Aug 24, 1993 |
| Priority date | — |
| Expiry date | Jan 27, 2012 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B29/40
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A video tracking system and a program employing frequency-domain analysis for extracting RHEED intensity oscillation data for film growth on rotating substrates. In initial experiments on GaAs growth, excellent (2%) agreement has been obtained between oscillation frequencies measured for static substrates and substrates with rotation rates as high as 10 rpm. The capability of performing RHEED analysis on rotating substrates could lead to improvements in the quality of complex epitaxial structures and interfaces for which interrupting rotation can have a deleterious effect.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.