Tough polymeric mixtures
US5238744A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 10, 1992 |
| Grant date | Aug 24, 1993 |
| Priority date | — |
| Expiry date | Jan 10, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31692
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A tough polymeric mixture comprises the polymerized product of admixture I or II, wherein PA0 admixture I comprises 5 to 45 weight percent of a first monomer and a photoinitiator therefor, said first monomer being at least one free-radically polymerizable monomer, and 95 to 55 weight percent of a second monomer and a photoinitiator therefor, said second monomer being at least one set of polyurethane precursors, and PA0 admixture II comprises 5 to 45 weight percent of a first monomer and a photoinitiator therefor, said first monomer being at least one set of polyurethane precursors, and 95 to 55 weight percent of a second monomer and a photoinitiator therefor, said second monomer being at least one free-radically polymerizable monomer, PA0 said polymeric mixture having been prepared by a process involving two sequential actinic radiations of wavelength ranges centered around .lambda..sub.1 and .lambda..sub.2, respectively, wherein .lambda..sub.1 and .lambda..sub.2 differ from each other by at least 30 nm, and PA0 wherein the actinic radiation centered around .lambda..sub.1 does not substantially polymerize the second monomer, and PA0 wherein the area under a stress-strain curve as d…
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