Radiation-sensitive composition containing 1,2-quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent
US5238774A · kind A · utility
16Cited by
9References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 4, 1991 |
| Grant date | Aug 24, 1993 |
| Priority date | — |
| Expiry date | Jun 4, 2011 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0226
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A radiation-sensitive resin composition comprising a solution of an alkali-soluble resin and a radiation-sensitive compound in a solvent comprising a monooxymonocarboxylic acid ester. This composition has a high storage stability (i.e., a very small amount of fine particles are formed during storage) and is suited for use as a resist for making integrated circuits.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.