Patent · US Expired

Conformal method of fabricating an optical waveguide on a semiconductor substrate

US5238877A · kind A · utility

48Cited by
14References
17Claims
0Family size

Assignee

Inventor

Key dates

Filing dateApr 30, 1992
Grant dateAug 24, 1993
Priority date
Expiry dateApr 30, 2012

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02B6/132
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A method for fabricating a conformal optical waveguide on a semiconductor bstrate which results in an improved conformal processing method of producing ferroelectic ceramic waveguides that is integratable with conventional electronic and optoelectronic devices. First, a patterning of a desired waveguide configuration is made on a desired semiconductor substrate. A conformal confinement layer is fabricated in the pattern of the desired waveguide configuration on the semiconductor substrate. The conformal confinement layer has an index of refraction. Next, the method calls for a placing of a sol-gel waveguide precursor in the conformal confinement layer. Next the spin casting of a sol-gel waveguide precursor shapes a sol-gel conformal waveguide layer in the conformal confinement layer on the semiconductor substrate. The annealing of the spin cast sol-gel conformal waveguide layer forms the conformal optical waveguide which has an index of refraction that is greater than the refractive index of the conformal confinement layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.