Force reflection with compliance control
US5239246A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jul 8, 1992 |
| Grant date | Aug 24, 1993 |
| Priority date | — |
| Expiry date | Jul 8, 2012 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB25J9/1633
- WIPO fieldHandling
- WIPO sectorMechanical engineering
Abstract
Two classes of systems for force-reflecting control that enable high force-reflection gain are presented: position-error-based force reflection and low-pass-filtered force reflection, both combined with shared compliance control. In the position-error-based class, the position error between the commanded and the actual position of a compliantly controlled robot is used to provide force reflection. In the low-pass-filtered force reflection class, the low-pass-filtered output of the compliance control is used to provide force reflection. The increase in force reflection gain can be more than 10-fold as compared to a conventional high-bandwidth pure force reflection system, when high compliance values are used for the compliance control.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.