Process and device for reducing free halogens in residual gasses
US5242668A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Nov 13, 1991 |
| Grant date | Sep 7, 1993 |
| Priority date | — |
| Expiry date | Nov 13, 2011 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D53/68
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An improved process and device for removing free halogen from residual gasses containing up to 15% by volume oxygen. Gaseous hydrocarbons and hydrogen are uniformly dispersed in the residual gasses either simultaneously or sequentially and preferentially reacted with the free halogen present before a competing reaction with oxygen can occur. The dispersion device includes an outer housing member, a centrally disposed second member which transports the residual gas from the burner through the cooling zone, and means for transporting gaseous hydrocarbons and hydrogen from the housing member to the second member for rapid and uniform dispersion in the residual gas stream.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.