Silver halide photographic light-sensitive material
US5242786A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 14, 1992 |
| Grant date | Sep 7, 1993 |
| Priority date | — |
| Expiry date | Feb 14, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/151
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is A silver halide photographic light-sensitive material formed by coating at least one silver halide photographic emulsion layer on a reflective support having irregularities at random on the surface, wherein the intensity of Wiener spectrum of the reflective support at a spatial frequency of f cycles/mm given by the expression f=1120/CS is less than 90% of the geometric mean of the intensity at a spatial frequency of f/2 cycles/mm and the intensity at a spatial frequency of 2f cycles/mm when the coating speed for said silver halide emulsion layer is CS (m/minute). The silver halide photographic light-sensitive material according to the invention, has a proper gross and a high capability of depicting details of an image.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.