Process for waste liquid-free processing of chlorosilane distillation residues with hydrochloric acid
US5246682A · kind A · utility
8Cited by
4References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 11, 1992 |
| Grant date | Sep 21, 1993 |
| Priority date | — |
| Expiry date | Aug 11, 2012 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA62D2101/22
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A process for waste liquid-free processing of residues of chlorosilane distillations, wherein the residue is allowed to react with liquid hydrochloric acid accompanied by the release of hydrogen chloride, the resulting reaction mixture is allowed to coagulate, the solid phase is separated and dried and heat-treated, and the liquid phase and the condensed gaseous constituents are recycled into the process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.