Patent · US Expired

Process for waste liquid-free processing of chlorosilane distillation residues with hydrochloric acid

US5246682A · kind A · utility

8Cited by
4References
3Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 11, 1992
Grant dateSep 21, 1993
Priority date
Expiry dateAug 11, 2012

Classification

  • Technology area (CPC A)Human Necessities
  • CPC primaryA62D2101/22
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

A process for waste liquid-free processing of residues of chlorosilane distillations, wherein the residue is allowed to react with liquid hydrochloric acid accompanied by the release of hydrogen chloride, the resulting reaction mixture is allowed to coagulate, the solid phase is separated and dried and heat-treated, and the liquid phase and the condensed gaseous constituents are recycled into the process.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.