Method of posttreating the focal track of X-ray rotary anodes
US5246742A · kind A · utility
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8Claims
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Inventor
Key dates
| Filing date | May 5, 1992 |
| Grant date | Sep 21, 1993 |
| Priority date | — |
| Expiry date | May 5, 2012 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J35/10
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The invention relates to a method of producing an X-ray rotary anode having a focal track region composed of refractory metals. The focal track region is manufactured by means of powder-metallurgy methods or by means of CVD or PVD methods. According to the invention, the focal track region is posttreated using high-energy electrons or photons by means of local, superficial melting to a depth of less than 1.5 mm. This reduces, in particular, the residual porosity in the focal track region. That results in improved mechanical properties, higher X-ray yield and markedly improved service life of such rotary anodes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.