Method of retouching pattern
US5246804A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 3, 1992 |
| Grant date | Sep 21, 1993 |
| Priority date | — |
| Expiry date | Aug 3, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/146
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention relates to a technique for retouching a pattern which is formed on one side of a substrate and which partially has defects. A method of retouching the pattern, according to the invention, comprises coating the one side of the substrate including the pattern, with a retouching protective membrane, exposing the one side of the substrate, with reference to portions having defects, filling the portions of the exposed one side of the substrate, with retouching material, and removing the retouching protective membrane. One of the retouching protective membrane and the retouching material is made of water-soluble material, while the other is made of oil-soluble material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.