Photosensitive material for screen processing
US5246815A · kind A · utility
5Cited by
4References
11Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | May 20, 1992 |
| Grant date | Sep 21, 1993 |
| Priority date | — |
| Expiry date | May 20, 2012 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/12
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photosensitive material for screen processing comprising a photosensitive resin composition (A) applied to a plastic film, and including a water-soluble or water-dispersible polymer or copolymer, an unsaturated compound, and a photopolymerization initiator, and a photosensitive resin composition (B) applied in a thickness of at least 0.1 .mu.m to the coated composition (A) and including a film-forming polymeric compound; and a photo-crosslinking polyvinyl alcohol partially containing photo-cross-linkable units provides a coating film which is water-developable, highly sensitive, and excellent in water and solvent resistances.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.