Radiation-senstive, ethylenically unsaturated, copolymerizable compounds and their preparation

US5248805A · kind A · utility

Assignee

• BASF SE

Inventors

• Andreas Boettcher · Leimen, DE
• Gerd Rehmer · Beindersheim, DE

Key dates

• Filing date: Mar 2, 1992
• Grant date: Sep 28, 1993
• Expiry date: Mar 2, 2012

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S522/905
• WIPO field: Macromolecular chemistry, polymers
• WIPO sector: Chemistry

Abstract

Radiation-sensitive, ethylenically unsaturated compounds and a process for their preparation. The ethylenically unsaturated organic compounds are of the general formula ##STR1## where R is alkyl, aryl or a radical R.sup.1 and PA1 R.sup.1 is a radical ##STR2## where R.sup.2 to R.sup.6 are each H, alkyl, OH, OAlkyl, SH, SAlkyl, halogen, N (Alkyl).sub.2 or N (Alkyl) (Aryl) and at least one but not more than three of the radicals R.sup.2 to R.sup.6 is or are a radical ##STR3## where X is alkylene, cycloalkylene, oxaalkylene or arylene, Y is H or CH.sub.3 -- and Z is O or NY. The novel radiation-sensitive ethylenically unsaturated compounds are suitable for the preparation of polymeric radiation-sensitive compounds.