Field emission device employing a selective electrode deposition method
US5249340A · kind A · utility
35Cited by
8References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 24, 1991 |
| Grant date | Oct 5, 1993 |
| Priority date | — |
| Expiry date | Jun 24, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J21/105
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method of forming a field emission device including the steps of selective deposition of a column/ridge within the confines of a conformally deposited insulator layer and subsequent directional deposition to form a cone/wedge, having a geometric discontinuity of small radius of curvature, on the column/ridge is provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.