Resist film coating apparatus
US5250116A · kind A · utility
20Cited by
4References
2Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 19, 1992 |
| Grant date | Oct 5, 1993 |
| Priority date | — |
| Expiry date | May 19, 2012 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05C11/1005
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A resist film coating apparatus comprises a resist receiving plate secured to a rotatable support plate carrying a wafer so as to be disposed along the outer periphery of the wafer, an interference type film thickness meter for measuring the thickness of a resist film spun out to the resist receiving plate, and modifying means for changing the revolution number of the support plate on the basis of a result of measurement by the film thickness meter such that a desired resist film thickness can be obtained.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.