Process of developing a negative-working radiation-sensitive photoresist containing cyclized rubber polymer and contrast enhancing azo dye

US5250392A · kind A · utility

Assignee

• OCG Microelectronic Materials, Inc. · US

Inventors

• Stephen F. Marcotte, Jr. · Central Falls, US
• John Griffiths · Leeds, GB

Key dates

• Filing date: Jan 25, 1993
• Grant date: Oct 5, 1993
• Expiry date: Jan 25, 2013

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/091
• WIPO field: Basic materials chemistry
• WIPO sector: Chemistry

Abstract

A negative-working, radiation-sensitive composition comprising an admixture in a solvent of: PA0 (a) at least one cyclized rubber polymer, PA0 (b) at least one photoactive compound, and PA0 (c) an effective contrast enhancing amount of at least one rubber-soluble azo dye containing a reactive acrylate or methacrylate group of formula (I): ##STR1## wherein Q is a reactive group of the structure ##STR2## wherein Y is either H or CH.sub.3 ; wherein R.sub.1 is either H, CH.sub.3, C.sub.2 H.sub.5, CH.sub.2 CH.sub.2 CN, CH CH.sub.2 OH or Q; PA0 wherein R.sub.2 is either H, CH.sub.3, OCH.sub.3, or NHCOCH.sub.3 ; PA0 wherein R.sub.3 is either H, OCH.sub.3 or OC.sub.2 H.sub.5 ; and PA0 wherein X is selected from the group consisting of an unsubstituted or a substituted benzene, thiazole, thiophene, benzothiazole, benzoisothiazole, thiadiazole, and pyrazole moiety having, if substituted, 1-3 substituent groups selected from cyano, nitro, acetyl, and halogen groups; the amount of said cyclized rubber being about 90% to 99.5% by weight, the amount of said photoactive component being about 0.5% to about 10% by weight, based on the total solids content of said radiation-sensitive composition.