Photo reticle for fabricating a semiconductor device
US5250983A · kind A · utility
34Cited by
10References
3Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jul 10, 1992 |
| Grant date | Oct 5, 1993 |
| Priority date | — |
| Expiry date | Jul 10, 2012 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31767
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An original layout pattern for reticle includes a tip pattern region, a scribe region formed around the tip pattern region, and alignment marks formed in the scribe region. Each end of the alignment marks is not reached to a edge of the original layout pattern. Therefore, when the original layout pattern is formed on the reticle side by side in predetermined times, the alignment marks positioned at an inner portion between two adjacent patterns are separated from each other.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.