Fe-Ni alloy sheet for shadow mask having a low silicon segregation and method for manufacturing same
US5252151A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 1, 1991 |
| Grant date | Oct 12, 1993 |
| Priority date | — |
| Expiry date | Oct 1, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2229/0733
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An Fe-Ni alloy sheet for a shadow mask, which consists essentially of: PA0 nickel: from 34 to 38 wt. %, PA0 silicon: from 0.01 to 0.15 wt. %, PA0 manganese: from 0.01 to 1.00 wt. %, and PA0 the balance being iron and incidental impurities. The surface portion of the alloy sheet has a silicon (Si) segregation rate, as expressed by the following formula, of up to 10%: ##EQU1## and a center-line mean roughness (Ra) of the alloy sheet satisfies the following formula: EQU 0.3 .mu.m<.ltoreq.Ra .ltoreq.0.7 .mu.m. The above-mentioned Fe-Ni alloy sheet is manufactured by preparing an Fe-Ni alloy sheet having the chemical composition and the silicon segregation rate as described above, and imparting a center-line mean roughness (Ra) which satisfies the above-mentioned formula onto the both surfaces of the alloy sheet by means of a pair of dull rolls during the final rolling of the alloy sheet for said preparation. The thus manufactured Fe-Ni alloy sheet is excellent in etching pierceability and free from the occurrence of sticking during the annealing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.