Reduced residue hard surface cleaner
US5252245A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 7, 1992 |
| Grant date | Oct 12, 1993 |
| Priority date | — |
| Expiry date | Feb 7, 2012 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D1/75
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The invention provides an aqueous, hard surface cleaner with significantly improved residue removed and substantially reduced filming/streaking, said cleaner comprising: PA0 (a) an effective amount of a solvent selected from C.sub.1-6 alkanol, C.sub.3-24 alkylene glycol ether, and mixtures thereof; PA0 (b) an effective amount of a surfactant selected from amphoteric, nonionic and anionic surfactants, and mixtures thereof; PA0 (c) an effective amount of a buffering system which comprises a nitrogenous buffer selected from the group consisting of: PA1 ammonium or alkaline earth carbamates, guanidine derivatives, alkoxylalkylamines and alkyleneamines; and PA0 (d) the remainder as substantially all water.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.