Process for developing a positive-working photoresist containing poly(p-hydroxystyrene) and sulfonium salt with an aqueous developer containing basic organic compounds

US5252436A · kind A · utility

Assignee

• BASF SE

Inventors

• Horst Binder · Lampertheim, DE
• Reinhold Schwalm · Monsheim, DE

Key dates

• Filing date: Nov 13, 1992
• Grant date: Oct 12, 1993
• Expiry date: Nov 13, 2012

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/322
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An aqueous developer suitable in particular for developing photoresists which contain a phenolic resin and an onium salt contains from 0.5 to 5 % by weight of a tetraalkylammonium hydroxide and from 5 to 25% by weight of at least one amine of the general formula ##STR1## where R.sup.1, R.sup.2 and R.sup.3 are identical or different and each is hydrogen, alkyl, hydroxyalkyl or aminoalkyl, or two of R.sup.1 to R.sup.3 combine to form a N-containing ring, with at least one of R.sup.1 to R.sup.3 being hydroxyalkyl or aminoalkyl.