Method and apparatus for analysis of gases using plasma
US5252827A · kind A · utility
12Cited by
4References
27Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 30, 1991 |
| Grant date | Oct 12, 1993 |
| Priority date | — |
| Expiry date | Aug 30, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J49/105
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In the analysis of a specimen gas for at least one impurity, the specimen is fed to a microwave-induced plasma and the plasma is analyzed for the impurity. The plasma is formed by gases fed to it via an inner tube and an outer tube around said inner tube. The specimen is fed in undiluted form via the inner tube and a second gas which may be a standard gas is fed via the outer tube. The specimen gas and the second gas have compositions which are the same as to at least 75% by volume, e.g. are both air. A variety of analysis processes is made available.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.