Radiation-sensitive polymers having sulfonyl urthane side chains and azide containing side chains in a mixture with diazo compounds containing
US5254431A · kind A · utility
5Cited by
10References
6Claims
0Family size
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Inventors
Key dates
| Filing date | Nov 23, 1992 |
| Grant date | Oct 19, 1993 |
| Priority date | — |
| Expiry date | Nov 23, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/107
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A radiation sensitive material suitable for the production of radiation sensitive plates for lithographic printing plate manufacture comprises a polymer having appendent azide-substituted aromatic ester groups and sulphonyl urethane groups. The radiation sensitive compound is produced by a process in which some hydroxyl and/or epoxide groups of a polymer are reacted with an azide substituted carboxylic acid or ester forming derivative thereof, and some hydroxyl groups are reacted with a sulphonyl isocyanate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.