Light-sensitive polymer, method for preparing the same and method for forming patterns
US5254439A · kind A · utility
6Cited by
1References
3Claims
0Family size
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Key dates
| Filing date | Mar 20, 1992 |
| Grant date | Oct 19, 1993 |
| Priority date | — |
| Expiry date | Mar 20, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/146
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
There is disclosed a polymer having linear --Si--O--Si-- bonds and --Si--Si--Si-- bonds, or polysilane bonds that are greater than trisilane bonds, sensitive to far ultraviolet rays. The polymer is prepared by polymerizing a dichlorosiloxane alone or with at least one dichlorosilane in an inert solvent in the presence of sodium. The polymer undergoes oxidation with oxygen plasma to form SiO.sub.2 resistant to oxygen dry etching, exhibits absorption peaks only in far ultraviolet, and is suitable for preparing a single layered resist or an upper resist of a two-layered system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.