Production of diffuse reflective coatings by atomic layer epitaxy
US5256244A · kind A · utility
117Cited by
2References
6Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 10, 1992 |
| Grant date | Oct 26, 1993 |
| Priority date | — |
| Expiry date | Feb 10, 2012 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B29/16
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Diffusely reflecting metal oxide, preferably titanium dioxide, coatings are prepared on substrates by atomic layer epitaxy. Successive pulses of a hydrolyzable metal chloride and water are introduced at pressures in the range of about 180-1250 and about 150-650 millitorr, respectively, the pulse length being effective to produce a coating with an average thickness of about 15-25 .ANG.ngstroms during a single pulse pair.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.