Cooled plasma source
US5256930A · kind A · utility
1Cited by
2References
16Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 10, 1992 |
| Grant date | Oct 26, 1993 |
| Priority date | — |
| Expiry date | Feb 10, 2012 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A cooled plasma source for producing ions by electrical discharge. A cooled plate is positioned in the chamber of the plasma source for blocking thermal radiation from an electron-emitting cathode. The presence of the cooled plate results in significantly decreased substrate temperatures, as compared to use of conventional plasma source apparatus. As a result, the cooled plasma source may be used for treatment of heat-sensitive plastic substrates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.