Silicon diimide, a process for its preparation and silicon nitride obtained therefrom
US5258169A · kind A · utility
5Cited by
6References
11Claims
0Family size
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Key dates
| Filing date | Sep 20, 1991 |
| Grant date | Nov 2, 1993 |
| Priority date | — |
| Expiry date | Sep 20, 2011 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01P2006/12
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Silicon diimide having a carbon content of at most 0.5% by weight and a chlorine content of at most 20 ppm is prepared by reacting ammonia with organyl amino silane at 50.degree.-300.degree. C. at elevated pressure and is useful as an intermediate for high grade silicon nitride.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.