Patent · US Expired

Silicon diimide, a process for its preparation and silicon nitride obtained therefrom

US5258169A · kind A · utility

5Cited by
6References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 20, 1991
Grant dateNov 2, 1993
Priority date
Expiry dateSep 20, 2011

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01P2006/12
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

Silicon diimide having a carbon content of at most 0.5% by weight and a chlorine content of at most 20 ppm is prepared by reacting ammonia with organyl amino silane at 50.degree.-300.degree. C. at elevated pressure and is useful as an intermediate for high grade silicon nitride.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.